Amagesi Akhethekile
-
I-Sulfur Tetrafluoride (SF4)
I-EINECS NO: 232-013-4
INOMBOLO YECAS: 7783-60-0 -
I-Nitrous oxide (N2O)
I-nitrous oxide, eyaziwa nangokuthi igesi ehlekayo, iyikhemikhali eyingozi enefomula yamakhemikhali ethi N2O. Igesi engenambala, enephunga elimnandi. I-N2O iyi-oxidant ekwazi ukusekela ukuvutha ngaphansi kwezimo ezithile, kodwa izinzile ezingeni lokushisa legumbi futhi inomphumela omncane wokubulala izinzwa. , futhi ingenza abantu bahleke. -
I-Carbon Tetrafluoride (CF4)
I-Carbon tetrafluoride, eyaziwa nangokuthi i-tetrafluoromethane, iyigesi engenambala emazingeni okushisa avamile nokucindezela, engancibiliki emanzini. I-CF4 gas njengamanje iyigesi esetshenziswa kakhulu e-plasma etching embonini ye-microelectronics. Ibuye isetshenziswe njengegesi yelaser, i-cryogenic refrigerant, i-solvent, i-lubricant, insulating material, kanye ne-coolant yamashubhu omtshina we-infrared. -
I-Sulfuryl Fluoride (F2O2S)
I-Sulfuryl fluoride SO2F2, igesi enobuthi, isetshenziswa kakhulu njengesibulala-zinambuzane. Ngenxa yokuthi i-sulfuryl fluoride inezici zokusabalaliswa okuqinile kanye nokungeneka, isibulala-zinambuzane esibanzi, umthamo ophansi, inani eliphansi lensalela, isivinini esisheshayo sokubulala izinambuzane, isikhathi esifushane sokuhlakazwa kwegesi, ukusetshenziswa kalula ezingeni lokushisa eliphansi, akukho mphumela ekuhlumeni kanye nobuthi obuphansi, Isetshenziswa kabanzi ezindaweni zokugcina izimpahla, emikhunjini yezimpahla, ezakhiweni, kumadamu echibi, ekuvimbeleni umuhlwa, njll. -
I-Silane (SiH4)
I-Silane SiH4 iyigesi ecindezelwe engenambala, enobuthi futhi esebenza kakhulu emazingeni okushisa ajwayelekile nokucindezela. I-Silane isetshenziswa kakhulu ekukhuleni kwe-epitaxial ye-silicon, izinto zokusetshenziswa ze-polysilicon, i-silicon oxide, i-silicon nitride, njll., amaseli elanga, ama-optical fibers, ukukhiqizwa kwengilazi enemibala, kanye nokubeka umhwamuko wamakhemikhali. -
I-Octafluorocyclobutane (C4F8)
I-Octafluorocyclobutane C4F8, ukuhlanzeka kwegesi: 99.999%, evame ukusetshenziswa njenge-aerosol propellant yokudla kanye negesi ephakathi. Ivame ukusetshenziswa ku-semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition) inqubo, i-C4F8 isetshenziswa esikhundleni se-CF4 noma i-C2F6, esetshenziswa njengokuhlanza igesi kanye nenqubo ye-semiconductor etching gas. -
I-Nitric oxide (NO)
I-nitric oxide gas iyinhlanganisela ye-nitrogen enefomula yamakhemikhali NO. Kuyigesi engenambala, engenaphunga, enobuthi engancibiliki emanzini. I-nitric oxide iyasebenza kakhulu ngokwekhemikhali futhi ihlangana nomoya-mpilo ukuze yakhe igesi edlayo i-nitrogen dioxide (NO₂). -
I-Hydrogen Chloride (HCl)
I-Hydrogen chloride HCL Gas iyigesi engenambala nephunga elimnandi. Isixazululo saso esinamanzi sibizwa nge-hydrochloric acid, eyaziwa nangokuthi i-hydrochloric acid. IHydrogen chloride isetshenziswa kakhulu ukwenza odayi, izinongo, imithi, ama-chloride ahlukahlukene kanye nama-corrosion inhibitors. -
I-Hexafluoropropylene (C3F6)
I-Hexafluoropropylene, ifomula yamakhemikhali: I-C3F6, igesi engenambala emazingeni okushisa avamile nokucindezela. Isetshenziselwa kakhulu ukulungisa imikhiqizo yamakhemikhali ahlanzekile aqukethe i-fluorine, izixhumi zemithi, izinto zokucima umlilo, njll., futhi ingasetshenziswa ukulungisa izinto ze-polymer ezine-fluorine. -
I-Amoniya (NH3)
I-ammonia ewuketshezi/i-anhydrous ammonia iyikhemikhali esetshenziswayo ebalulekile enezinto eziningi ezisetshenziswayo. I-ammonia ewuketshezi ingasetshenziswa njengesiqandisi. Isetshenziswa kakhulu ukukhiqiza i-nitric acid, i-urea kanye nezinye izivundisi zamakhemikhali, futhi ingasetshenziswa njengempahla eluhlaza emithini nezibulala-zinambuzane. Embonini yezokuvikela, isetshenziselwa ukwenza ama-propellants amarokhethi nemicibisholo.
