Amagesi Akhethekile
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I-Tetrafluoride ye-Sulfur (SF4)
Inombolo ye-EINECS: 232-013-4
INOMBOLO YE-CAS: 7783-60-0 -
I-Nitrous Oxide (N2O)
I-nitrous oxide, eyaziwa nangokuthi i-laughing gas, iyikhemikhali eyingozi enefomula yamakhemikhali i-N2O. Iyigesi engenambala, enephunga elimnandi. I-N2O iyi-oxidant engasekela ukusha ngaphansi kwezimo ezithile, kodwa izinzile ekushiseni kwegumbi futhi inomphumela omncane wokubulala izinzwa. , futhi ingenza abantu bahleke. -
I-Carbon Tetrafluoride (CF4)
I-Carbon tetrafluoride, eyaziwa nangokuthi i-tetrafluoromethane, iyigesi engenambala ekushiseni okuvamile kanye nengcindezi, engancibiliki emanzini. Igesi ye-CF4 okwamanje iyigesi esetshenziswa kakhulu ekuqopheni i-plasma embonini yama-microelectronics. Iphinde isetshenziswe njengegesi ye-laser, i-cryogenic refrigerant, i-solvent, i-lubricant, i-insulating material, kanye ne-coolant yamashubhu okubona i-infrared. -
I-Sulfuryl Fluoride (F2O2S)
I-Sulfuryl fluoride SO2F2, igesi enobuthi, isetshenziswa kakhulu njengesibulala-zinambuzane. Ngenxa yokuthi i-sulfuryl fluoride inezici zokusabalala okunamandla kanye nokuvuleka, isibulala-zinambuzane esibanzi, umthamo ophansi, inani eliphansi lensalela, isivinini esisheshayo sokubulala izinambuzane, isikhathi esifushane sokusabalala kwegesi, ukusetshenziswa okulula ekushiseni okuphansi, akukho mthelela esilinganisweni sokuhluma kanye nobuthi obuphansi, kulapho isetshenziswa kabanzi kakhulu ezindaweni zokugcina izimpahla, emikhunjini yezimpahla, ezakhiweni, emadamini okugcina amanzi, ekuvimbeleni umuhlwa, njll. -
I-Silane (SiH4)
I-Silane SiH4 iyigesi ecindezelwe engenambala, enobuthi futhi esebenzayo kakhulu ekushiseni nasekucindezelweni okuvamile. I-Silane isetshenziswa kabanzi ekukhuleni kwe-epitaxial kwe-silicon, izinto zokusetshenziswa ze-polysilicon, i-silicon oxide, i-silicon nitride, njll., amaseli elanga, imicu ye-optical, ukukhiqizwa kwengilazi enemibala, kanye nokufakwa komphunga wamakhemikhali. -
I-Octafluorocyclobutane (C4F8)
I-Octafluorocyclobutane C4F8, ubumsulwa begesi: 99.999%, evame ukusetshenziswa njenge-aerosol propellant yokudla kanye negesi ephakathi. Ivame ukusetshenziswa enqubweni ye-semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), i-C4F8 isetshenziswa esikhundleni se-CF4 noma i-C2F6, esetshenziswa njengegesi yokuhlanza kanye negesi yokusika inqubo ye-semiconductor. -
I-Nitric Oxide (CHA)
Igesi ye-nitric oxide iyinhlanganisela ye-nitrogen enefomula yamakhemikhali ethi CHA. Iyigesi engenambala, engenaphunga, enobuthi engancibiliki emanzini. I-nitric oxide isabela kakhulu ngamakhemikhali futhi isabela nomoya-mpilo ukuze yakhe igesi ebolile i-nitrogen dioxide (NO₂). -
I-Hydrogen Chloride (HCl)
I-Hydrogen chloride HCL Gas iyigesi engenambala enephunga elimnandi. Isixazululo sayo samanzi sibizwa ngokuthi i-hydrochloric acid, esaziwa nangokuthi i-hydrochloric acid. I-Hydrogen chloride isetshenziswa kakhulu ukwenza udayi, izinongo, imithi, ama-chloride ahlukahlukene kanye nezithiyo zokugqwala. -
I-Hexafluoropropylene (C3F6)
I-Hexafluoropropylene, ifomula yamakhemikhali: C3F6, iyigesi engenambala ekushiseni okuvamile kanye nengcindezi. Isetshenziswa kakhulu ukulungisa imikhiqizo ehlukahlukene yamakhemikhali equkethe i-fluorine, izinto zokwelapha, izinto zokucima umlilo, njll., futhi ingasetshenziswa futhi ukulungisa izinto ze-polymer eziqukethe i-fluorine. -
I-Amoniya (NH3)
I-ammonia ewuketshezi / i-ammonia engenamanzi iyinto ebalulekile yamakhemikhali enokusetshenziswa okubanzi. I-ammonia ewuketshezi ingasetshenziswa njengesiqandisi. Isetshenziswa kakhulu ukukhiqiza i-nitric acid, i-urea kanye neminye imifino yamakhemikhali, futhi ingasetshenziswa njengezinto zokusetshenziswa kwemithi kanye nezibulala-zinambuzane. Embonini yezokuvikela, isetshenziselwa ukwenza ama-propellant amarokhethi kanye nemicibisholo.
