I-Carbon Tetrafluoride (CF4)

Imingcele Yezobuchwepheshe

I-Carbon tetrafluoride iyi-halogenated hydrocarbon enefomula yamakhemikhali i-CF4.Ingathathwa njenge-halogenated hydrocarbon, i-halogenated methane, i-perfluorocarbon, noma njengenhlanganisela ye-inorganic.I-Carbon tetrafluoride iyigesi engenambala nengenaphunga, ayincibiliki emanzini, encibilika ku-benzene ne-chloroform.Izinzile ngaphansi kwezinga lokushisa elivamile nokucindezela, gwema ama-oxidants aqinile, izinto ezivuthayo noma ezivuthayo.Igesi engashi, ukucindezela kwangaphakathi kwesiqukathi kuzokhula lapho kuvezwa ukushisa okuphezulu, futhi kunengozi yokuqhekeka nokuqhuma.Iqinile kumakhemikhali futhi ayishi.I-reagent yensimbi ye-ammonia-sodium kuphela engasebenza ekamelweni lokushisa.I-Carbon tetrafluoride iyigesi ebangela umphumela we-greenhouse.Izinzile kakhulu, ingahlala emkhathini isikhathi eside, futhi iyigesi ebamba ukushisa enamandla kakhulu.I-Carbon tetrafluoride isetshenziswa kunqubo yokufaka i-plasma yamasekethe ahlukahlukene ahlanganisiwe.Ibuye isetshenziswe njengegesi ye-laser, futhi isetshenziswa eziqandisini ezinezinga lokushisa eliphansi, izinto ezincibilikisayo, izinto zokugcoba, izinto zokuvikela ukushisa, kanye nezinto ezipholisa amafu emithonjeni ye-infrared.Yigesi esetshenziswa kakhulu ye-plasma etching embonini ye-microelectronics.Kuyingxube yegesi ye-tetrafluoromethane ene-high-purity kanye ne-tetrafluoromethane high-purity gas kanye ne-high-purity oxygen.Ingasetshenziswa kabanzi ku-silicon, i-silicon dioxide, i-silicon nitride, nengilazi ye-phosphosilicate.Ukufakwa kwezinto zefilimu ezacile njenge-tungsten ne-tungsten nakho kusetshenziswa kabanzi ekuhlanzeni okungaphezulu kwezinto zikagesi, ukukhiqizwa kwamaseli elanga, ubuchwepheshe be-laser, isiqandisi esisezingeni eliphansi lokushisa, ukuhlolwa kokuvuza, kanye nokuhlanza ekukhiqizeni isekethe ephrintiwe.Isetshenziswa njengesiqandisi esinezinga lokushisa eliphansi kanye nobuchwepheshe bokufaka okomile be-plasma kumasekhethi ahlanganisiwe.Izinyathelo zokuphepha zokugcina: Gcina endaweni epholile, engenamoya engashi.Gcina kude nomlilo nemithombo yokushisa.Izinga lokushisa lokugcina akufanele lidlule ku-30°C.Kufanele igcinwe ngokuhlukana nezinto ezivuthayo kalula (ezivuthayo) kanye nama-oxidants, futhi igweme ukugcinwa okuxubile.Indawo yokugcina kufanele ifakwe okokusebenza okuphuthumayo okuvuzayo.

Isicelo:

① Isiqandisi:

I-Tetrafluoromethane ngezinye izikhathi isetshenziswa njengesiqandisi esiphansi sokushisa.

② Ukufaka:

Isetshenziswa ku-electronics microfabrication iyodwa noma ihlanganiswe nomoya-mpilo njenge-plasma etchant ye-silicon, i-silicon dioxide, ne-silicon nitride.

Iphakheji evamile:

Inzuzo:

①Ukuhlanzeka okuphezulu, indawo yakamuva;

②ISO umenzi wesitifiketi;

③Ukulethwa okusheshayo;

④Isistimu yokuhlaziya eku-inthanethi yokulawula ikhwalithi kuso sonke isinyathelo;

⑤Imfuneko ephezulu kanye nenqubo ecophelelayo yokuphatha isilinda ngaphambi kokugcwalisa;