Ubuchwepheshe be-Dry Etching bungenye yezinqubo ezibalulekile. Igesi eyomile etching iyinto ebalulekile ekwenziweni kwemithimonductor kanye nomthombo obalulekile wegesi we-plasma etching. Ukusebenza kwayo kuthinta ngqo ikhwalithi nokusebenza komkhiqizo wokugcina. Lo mbhalo uhlanganyela ikakhulukazi amagesi asetshenziswa kakhulu e-etching enqubweni e-etching eyomile.
Amagesi asuselwa ku-Fluorine: njengeI-Carbon Tetrafluoride (CF4), hexafluorooroenane (C2FF), Trifluoromeselane (CHF3) kanye nePurfuoropropane (C3F8). Lawa magesi angakhiqiza ngempumelelo ama-fleariate aguqukayo lapho etching silicon nama-silicon compounds, ngaleyo ndlela athole ukususwa kwezinto ezibonakalayo.
Amagesi asuselwa ku-Chlorine: njenge-chlorine (CL2),UBoron Trichloride (BCL3)kanye ne-silicon tetrachloride (SICL4). Amagesi asuselwa ku-Chlorine anganikeza ama-chloride ion ngesikhathi senqubo ye-etching, esiza ukuthuthukisa izinga loku-etching kanye nokukhetha.
Amagesi asuselwa kwi-Bromine: njenge-Bromine (BR2) ne-Bromine iodide (ibr). Amagesi asuselwa eBromine anganikeza ukusebenza okungcono kwe-etching kwezinqubo ezithile zokugcina, ikakhulukazi lapho efaka izinto ezinzima njenge-silicon carbide.
Amagesi asuselwa ku-nitrogen nama-oxygen: njenge-nitrogen trifluoride (NF3) ne-OXYGEN (O2). Lawa magesi ajwayele ukusetshenziselwa ukulungisa izimo zokusabela kwinqubo e-etching ukuthuthukisa ukukhetha nokufundiswa kwe-etching.
Lawa magesi athola ukufakwa okuqondile kwendawo ebonakalayo ngokuhlanganiswa kokusabela okubonakalayo nokusabela kwamakhemikhali ngesikhathi se-plasma etching. Ukukhethwa kwegesi etching kuncike ohlotsheni lwezinto ezisetshenziswayo, izidingo zokukhetha ze-etching, kanye nezinga elifunekayo le-etching.
Isikhathi sePosi: Feb-08-2025
