I-Carbon Tetrafluoride (CF4)

Imingcele Yezobuchwepheshe

I-Carbon tetrafluoride iyi-halogenated hydrocarbon enefomula yamakhemikhali i-CF4. Ingathathwa njenge-halogenated hydrocarbon, i-halogenated methane, i-perfluorocarbon, noma njengenhlanganisela ye-inorganic. I-Carbon tetrafluoride iyigesi engenambala nengenaphunga, ayincibiliki emanzini, encibilika ku-benzene ne-chloroform. Izinzile ngaphansi kwezinga lokushisa elivamile nokucindezela, gwema ama-oxidants aqinile, izinto ezivuthayo noma ezivuthayo. Igesi engashi, ukucindezela kwangaphakathi kwesiqukathi kuzokwanda lapho kuvezwa ukushisa okuphezulu, futhi kunengozi yokuqhekeka nokuqhuma. Iqinile kumakhemikhali futhi ayishi. I-reagent yensimbi ye-ammonia-sodium kuphela engasebenza ekamelweni lokushisa. I-Carbon tetrafluoride iyigesi ebangela umphumela we-greenhouse. Izinzile, ingahlala emkhathini isikhathi eside, futhi iyigesi ebamba ukushisa enamandla kakhulu. I-Carbon tetrafluoride isetshenziswa kunqubo yokufaka i-plasma yamasekethe ahlukahlukene ahlanganisiwe. Ibuye isetshenziswe njengegesi ye-laser, futhi isetshenziswa eziqandisini ezinezinga lokushisa eliphansi, izinto ezincibilikisayo, izinto zokugcoba, izinto zokuvikela ukushisa, kanye nezinto ezipholisa amafu emithonjeni ye-infrared. Yigesi esetshenziswa kakhulu ye-plasma etching embonini ye-microelectronics. Kuyingxube yegesi ye-tetrafluoromethane ene-high-purity kanye ne-tetrafluoromethane high-purity gas kanye ne-high-purity oxygen. Ingasetshenziswa kabanzi ku-silicon, i-silicon dioxide, i-silicon nitride, nengilazi ye-phosphosilicate. Ukufakwa kwezinto zefilimu ezacile njenge-tungsten ne-tungsten nakho kusetshenziswa kabanzi ekuhlanzeni okungaphezulu kwezinto zikagesi, ukukhiqizwa kwamaseli elanga, ubuchwepheshe be-laser, isiqandisi esisezingeni eliphansi lokushisa, ukuhlolwa kokuvuza, kanye nokuhlanza ekukhiqizeni isekethe ephrintiwe. Isetshenziswa njengesiqandisi esinezinga lokushisa eliphansi kanye nobuchwepheshe bokufaka okomile be-plasma kumasekhethi ahlanganisiwe. Izinyathelo zokuphepha zokugcina: Gcina endaweni epholile, engenamoya engashi. Gcina kude nomlilo nemithombo yokushisa. Izinga lokushisa lokugcina akufanele lidlule ku-30°C. Kufanele igcinwe ngokuhlukana nezinto ezikwazi ukuvutha kalula (ezivuthayo) kanye nama-oxidants, futhi igweme ukugcinwa okuxubile. Indawo yokugcina kufanele ifakwe okokusebenza okuphuthumayo okuvuzayo.

Isicelo:

① Isiqandisi:

I-Tetrafluoromethane ngezinye izikhathi isetshenziswa njengesiqandisi esiphansi sokushisa.

② Ukufaka:

Isetshenziswa ku-electronics microfabrication iyodwa noma ihlanganiswe nomoya-mpilo njenge-plasma etchant ye-silicon, i-silicon dioxide, ne-silicon nitride.

Iphakheji evamile:

Inzuzo:

①Ukuhlanzeka okuphezulu, indawo yakamuva;

②ISO umenzi wesitifiketi;

③Ukulethwa okusheshayo;

④Isistimu yokuhlaziya eku-inthanethi yokulawula ikhwalithi kuso sonke isinyathelo;

⑤Isidingo esiphezulu kanye nenqubo yokucophelela yokuphatha isilinda ngaphambi kokugcwalisa;