Indima ye-sulfur hexafluoride ekuqopheni i-silicon nitride

I-hexafluoride yesulfure iyigesi enezakhiwo ezinhle kakhulu zokuvimbela futhi ivame ukusetshenziswa kuma-extinguishing e-arc ane-voltage ephezulu kanye nama-transformer, imigqa yokudlulisela ye-high-voltage, ama-transformer, njll. Kodwa-ke, ngaphezu kwale misebenzi, i-hexafluoride yesulfure ingasetshenziswa futhi njenge-etchant ye-elekthronikhi. I-hexafluoride ye-sulfur yezinga eliphezulu le-elekthronikhi iyi-etchant ye-elekthronikhi efanelekile, esetshenziswa kabanzi emkhakheni wobuchwepheshe be-microelectronics. Namuhla, umhleli wegesi okhethekile we-Niu Ruide uYueyue uzokwethula ukusetshenziswa kwe-hexafluoride yesulfure ekuqopheni kwe-silicon nitride kanye nethonya lamapharamitha ahlukene.

Sixoxa ngenqubo ye-SF6 plasma etching SiNx, okuhlanganisa ukushintsha amandla e-plasma, isilinganiso segesi se-SF6/He kanye nokwengeza igesi ye-cationic O2, sixoxa ngethonya layo esilinganisweni sokuchoma sesendlalelo sokuvikela isici se-SiNx se-TFT, kanye nokusebenzisa imisebe ye-plasma. I-spectrometer ihlaziya izinguquko zokuhlushwa kwezinhlobo ngazinye ku-SF6/He, SF6/He/O2 plasma kanye nesilinganiso sokuhlukaniswa kwe-SF6, futhi sihlola ubudlelwano phakathi kokushintsha kwesilinganiso sokuchoma se-SiNx kanye nokuhlushwa kwezinhlobo ze-plasma.

Izifundo zithole ukuthi lapho amandla e-plasma ekhuliswa, izinga lokusika liyakhuphuka; uma izinga lokugeleza kwe-SF6 ku-plasma likhuphuka, ukuhlushwa kwe-athomu ye-F kuyakhuphuka futhi kuhlobene kahle nezinga lokusika. Ngaphezu kwalokho, ngemva kokufaka igesi ye-cationic i-O2 ngaphansi kwesilinganiso sokugeleza esinqunyiwe, kuzoba nomphumela wokwandisa izinga lokusika, kodwa ngaphansi kwezilinganiso zokugeleza ze-O2/SF6 ezahlukene, kuzoba nezindlela ezahlukene zokusabela, ezingahlukaniswa zibe izingxenye ezintathu: (1) Isilinganiso sokugeleza kwe-O2/SF6 sincane kakhulu, i-O2 ingasiza ekuhlukaniseni i-SF6, futhi izinga lokusika ngalesi sikhathi likhulu kunalapho i-O2 ingafakwanga. (2) Lapho isilinganiso sokugeleza kwe-O2/SF6 singaphezu kuka-0.2 esikhawulweni esisondela ku-1, ngalesi sikhathi, ngenxa yenani elikhulu lokusika kwe-SF6 ukwakha ama-athomu e-F, izinga lokusika liphezulu kakhulu; kodwa ngesikhathi esifanayo, ama-athomu e-O ku-plasma nawo ayanda futhi Kulula ukwakha i-SiOx noma i-SiNxO(yx) ngobuso befilimu ye-SiNx, futhi lapho ama-athomu e-O ekhula kakhulu, kulapho ama-athomu e-F azoba nzima kakhulu ekuphenduleni kokuchoma. Ngakho-ke, izinga lokuchoma liqala ukwehla lapho isilinganiso se-O2/SF6 siseduze no-1. (3) Lapho isilinganiso se-O2/SF6 sikhulu kuno-1, izinga lokuchoma liyancipha. Ngenxa yokwanda okukhulu kwe-O2, ama-athomu e-F ahlukanisiwe ahlangana ne-O2 kanye nefomu le-OF, okunciphisa ukuhlushwa kwama-athomu e-F, okuholela ekwehleni kwesilinganiso sokuchoma. Kungabonakala kulokhu ukuthi lapho i-O2 ingezwa, isilinganiso sokugeleza se-O2/SF6 siphakathi kuka-0.2 no-0.8, futhi izinga lokuchoma elihle kakhulu lingatholakala.