Iqhaza leSulfur Hexafluoride eSilicon Nitride Etching

I-Sulfir Hexafluoride iyigesi enezinto ezinhle kakhulu zokufaka okufakwayo futhi ivame ukusetshenziswa ekucingeni kwamandla aphezulu we-arc kanye nama-transformers, ama-transformers, njll. Noma kunjalo, ngaphezu kwale misebenzi, ngaphezu kwale misebenzi, ngaphezu kwale misebenzi, kungenjalo, futhi, ngaphezu kwale misebenzi, ngaphezu kwemisebenzi, ngaphezu kwalomsebenzi, kungenjalo, futhi, ngaphezu kwale misebenzi, ngaphezu kwale misebenzi, kungenjalo, futhi, ngaphezu kwale misebenzi, ngaphezu kwemisebenzi, kungenjalo, futhi, ngaphezu kwale misebenzi, ngaphezu kwemisebenzi, ngaphezu kwale misebenzi, kungenjalo, futhi, ngaphezu kwale misebenzi, ngaphezu kwemisebenzi, ngaphezu kwemisebenzi isetshenziswa njenge-etchant ye-elekthronikhi. I-Electronic Baght Headlity Hexafluiride iyindlela efanelekile ye-elekthronikhi ye-elekthronikhi, esetshenziswa kabanzi emkhakheni we-microelectronics technology. Namuhla, i-NII REAIDE i-yueyue ekhethekile izokwethula ukusetshenziswa kwe-sulfur hexafluoride eSilicon Nitride Etching kanye nethonya lamapharamitha ahlukile.

Sixoxa nge-SF6 plasma etching sonx inqubo, kufaka phakathi ukuguqula amandla we-plasma, isilinganiso segesi se-SF6 / yena futhi singeze ithonya layo ngesilinganiso se-spectrometer sihlaziya izinguquko zokuhlupha kwe-SF6 / yena, sf6 / yena / O2 PLASMA kanye ne-SF6 Izinga lokuhlukaniswa, bese lihlola ubudlelwano phakathi kokushintshwa kwezinga lokushintsha kwe-sinx etching kanye nezinhlobo zezilwane.

Ucwaningo luthole ukuthi lapho kukhuphuka amandla we-plasma, izinga loku-etching liyanda; Uma izinga lokugeleza kwe-SF6 ku-plasma liyanda, ukuncishiswa kwe-athomu kwe-F analo futhi kuhlobene kahle nezinga loku-etching. Ngaphezu kwalokho, ngemuva kokungeza i-cationic gesi ye-O2 ngaphansi kwesilinganiso sokugeleza okuphelele, kuzoba nomphumela wokwandisa izinga loku-etching, kepha ngaphansi kwezilinganiso ezihlukile zokugeleza kwe-O2 / SF6, kanti kuzohlukaniswa izingxenye ezintathu ze-O2 / SF6, kanti kuzokusiza ukuhlukaniswa kwezilinganiso ze-SF6, futhi kuzokusiza ukuhlukaniswa kwe-SF6, futhi izinga lokungena ngalesi sikhathi likhulu kunaleso sikhathi i-O2. . Kepha ngasikhathi sinye, ama-athomu o-plasma ayanda futhi kulula ukwakha i-siox noma i-sinxo) nge-sonox film komhlaba, kanti ama-athomu amaningi akhuphuka, ama-athomu amaningi azokhula ngokwengeziwe. Ngakho-ke, izinga loku-etching liqala ukwehlisa ijubane lapho isilinganiso se-O2 / SF6 siseduze no-1. (3) Lapho isilinganiso se-O2 / SF6 sikhulu kune-1, izinga loku-etching liyancipha. Ngenxa yokwanda okukhulu kwe-O2, ama-athomu ahlaselwe ama-athomu angqubuzana ne-O2 nefomu, elinciphisa ukugcwala kwama-athomu e-F, okuholela ekwehliseni izinga loku-etching. Kungabonakala kulokhu ukuthi lapho kufakwa i-O2, isilinganiso sokugeleza kwe-O2 / SF6 siphakathi kuka-0,2 no-0,8, kanye nezinga elihle kakhulu le-etching lingatholakala.