Igesi ye-laser

I-Laser gesi isetshenziselwa ikakhulukazi i-laser anveling ne-lithography gesi embonini ye-elekthronikhi. Ukuzuza ekusungulweni kwezikrini zefoni ephathekayo kanye nokwanda kwezindawo zohlelo lokusebenza, isilinganiso semakethe ye-polysilicon ephansi sizokweqiwa futhi, futhi inqubo ye-laser annealing ithuthukise kakhulu ukusebenza kwama-TFTs. Phakathi kwamagesi we-neon, ama-fluorine, kanye namagesi e-argen asetshenziswa i-arf exgimer laser yokukhiqiza ama-semiconductors, ama-neon ama-akhawunti angaphezu kwama-96% wengxube yegesi ye-laser. Ngokucwengwa kobuchwepheshe be-semiconductor, ukusetshenziswa kwama-lasesmers e-excimer kukhuphuke, futhi ukwethulwa kobuchwepheshe bokuvezwa okuphindwe kabili kuholele ekunyuseni okubukhali kwesidingo segesi ye-neon edliwe yi-ARF Excimer Lasers. Ukuzuza ekukhuthazeni kwasendaweni kwamagesi akhethekile kagesi, abakhiqizi basekhaya bazoba nendawo engcono yokukhula kwemakethe ngokuzayo.

Umshini we-Lithography ungumshini oyisisekelo wokukhiqiza i-semiconductor. I-Lithography ichaza usayizi wama-transistors. Ukuthuthukiswa okuhlanganisiwe kochungechunge lwemboni ye-lithoviek kuyisihluthulelo sokuphumelela komshini we-lithography. Izinto ezihambelana nezimonyo ze-semiconductor ezifana ne-Photoresist, i-PhotoLithography Ger, PhotoMask, kanye nokuhlanganisa kanye nemishini yokuthuthukisa inokuqukethwe okuphezulu kwezobuchwepheshe. I-Lithography gesi yigesi umshini we-lithophs akhiqize i-ultraviolet laser ejulile. Amagesi ahlukene we-lithography angakhiqiza imithombo ekhanyayo yama-wavelength ahlukene, futhi i-wavelength yayo ithinta ngqo ukulungiswa komshini we-lithography, okungenye yezindawo zomshini we-lithography. Ngo-2020, ukuthengiswa okuphelele kwembulunga yonke kwemishini ye-Lithography kuzoba ngamayunithi angama-413, lapho ama-ASML athengisa amayunithi angama-258 abhalwe ngama-62%, amayunithi e-canon angu-122 abhalwe amayunithi angama-30% abhalwe ngo-8%.