Igesi ye-laser isetshenziswa kakhulu ukuhlanganisa i-laser annealing kanye negesi ye-lithography embonini ye-electronics. Ngokuhlomula ekwakhiweni okusha kwezikrini zomakhalekhukhwini kanye nokwandiswa kwezindawo zokufaka izicelo, izinga lemakethe ye-polysilicon esezingeni eliphansi lizophinde linwetshwe, futhi inqubo ye-laser annealing ithuthukise kakhulu ukusebenza kwama-TFT. Phakathi kwe-neon, fluorine, namagesi e-argon asetshenziswa ku-ArF excimer laser ekwenzeni ama-semiconductors, i-neon ibala ngaphezu kwama-96% engxube yegesi ye-laser. Ngokulungiswa kobuchwepheshe be-semiconductor, ukusetshenziswa kwe-excimer lasers kwenyukile, futhi ukwethulwa kobuchwepheshe bokuchayeka kabili kuholele ekwenyukeni okukhulu kwesidingo segesi ye-neon esetshenziswa ama-lasers e-ArF excimer. Ngokuzuza ekukhuthazeni ukwenziwa kwendawo kwamagesi akhethekile kagesi, abakhiqizi basekhaya bazoba nendawo engcono yokukhula kwemakethe esikhathini esizayo.
Umshini we-Lithography uyisisetshenziswa esibalulekile sokwenza i-semiconductor. I-Lithography ichaza ubukhulu be-transistors. Ukuthuthukiswa okudidiyelwe kochungechunge lwemboni ye-lithography kuyisihluthulelo sokuphumelela komshini we-lithography. Izinto ezifanayo ze-semiconductor ezifana ne-photoresist, igesi ye-photolithography, i-photomask, nemishini yokumboza kanye neyokuthuthukisa inokuqukethwe okuphezulu kwezobuchwepheshe. I-lithography gas igesi umshini we-lithography okhiqiza i-laser ultraviolet ejulile. Amagesi e-lithography ahlukene angakhiqiza imithombo yokukhanya yamaza ahlukene, futhi ubude bawo buthinta ngokuqondile ukulungiswa komshini we-lithography, okungenye yezintambo zomshini we-lithography. Ngo-2020, isamba esiphelele sokuthengiswa kwemishini ye-lithography emhlabeni wonke kuzoba amayunithi angama-413, lapho i-ASML ithengisa amayunithi angama-258 abalelwa ku-62%, iCanon idayise amayunithi ayi-122 abalelwa ku-30%, kwathi ukuthengiswa kwe-Nikon amayunithi angama-33 kubalwe u-8%.
Isikhathi sokuthumela: Oct-15-2021
