Igesi ye-laser isetshenziswa kakhulu ekufakweni kwegesi ye-laser kanye ne-lithography embonini ye-elekthronikhi. Izuza emisha yezikrini zefoni ephathekayo kanye nokwandiswa kwezindawo zokufaka isicelo, ubukhulu bemakethe ye-polysilicon yokushisa okuphansi buzokwandiswa kakhulu, futhi inqubo yokufakwa kwegesi ye-laser ithuthukise kakhulu ukusebenza kwama-TFT. Phakathi kwamagesi e-neon, i-fluorine, kanye ne-argon asetshenziswa ku-laser ye-ArF excimer yokukhiqiza ama-semiconductor, i-neon ihlanganisa ngaphezu kwama-96% engxube yegesi ye-laser. Ngokuthuthuka kobuchwepheshe be-semiconductor, ukusetshenziswa kwama-laser e-excimer kukhuphukile, futhi ukwethulwa kobuchwepheshe bokuchayeka kabili kuholele ekwandeni okukhulu kwesidingo segesi ye-neon esetshenziswa ama-laser e-ArF excimer. Bezuza ekukhuthazeni ukutholakala kwamagesi akhethekile kagesi, abakhiqizi basekhaya bazoba nendawo engcono yokukhula kwemakethe esikhathini esizayo.
Umshini we-Lithography uwumshini oyinhloko wokukhiqiza ama-semiconductor. I-Lithography ichaza ubukhulu bama-transistors. Ukuthuthukiswa okuhlanganisiwe kochungechunge lwemboni ye-lithography kuyisihluthulelo sokuthuthuka komshini we-lithography. Izinto ze-semiconductor ezifanayo ezifana ne-photoresist, igesi ye-photolithography, i-photomask, kanye nemishini yokugqoka kanye nokuthuthukisa zinokuqukethwe okuphezulu kobuchwepheshe. Igesi ye-Lithography yigesi umshini we-lithography okhiqiza i-ultraviolet laser ejulile. Amagesi ahlukene e-lithography angakhiqiza imithombo yokukhanya yamaza ahlukene, futhi ubude bawo buthinta ngqo ukuxazululwa komshini we-lithography, okungenye yezingxenye zomshini we-lithography. Ngo-2020, ukuthengiswa okuphelele komhlaba wonke kwemishini ye-lithography kuzoba amayunithi angu-413, lapho ukuthengiswa kwe-ASML amayunithi angu-258 abiza u-62%, ukuthengiswa kwe-Canon amayunithi angu-122 abiza u-30%, kanye nokuthengiswa kwe-Nikon amayunithi angu-33 abiza u-8%.
Isikhathi sokuthunyelwe: Okthoba-15-2021
