I-Boron trichloride (BCl3)iyinhlanganisela ye-inorganic evame ukusetshenziswa ezinqubweni ze-etching ezomile kanye ne-chemical vapor deposition (CVD) ekwenzeni i-semiconductor. Kuyigesi engenambala enephunga elimnandi elinamandla ekamelweni lokushisa futhi izwela emoyeni oswakeme ngoba i-hydrolyzes ikhiqize i-hydrochloric acid ne-boric acid.

Ukusetshenziswa kwe-Boron Trichloride

Embonini ye-semiconductor,I-Boron trichlorideisetshenziselwa kakhulu ukunamathisela okomile kwe-aluminium futhi njenge-dopant ukuze kwakhiwe izifunda zohlobo lwe-P kumawafa e-silicon. Ingase futhi isetshenziselwe ukunamathisela izinto ezifana ne-GaAs, Si, AlN, futhi njengomthombo we-boron kwezinye izinhlelo zokusebenza ezithile. Ngaphezu kwalokho, i-Boron trichloride isetshenziswa kakhulu ekucubunguleni insimbi, embonini yengilazi, ekuhlaziyweni kwamakhemikhali kanye nocwaningo lwaselabhorethri.

Ukuphepha kwe-Boron Trichloride

I-Boron trichlorideiyagqwala futhi inobuthi futhi ingabangela umonakalo omkhulu emehlweni nasesikhumbeni. I-hydrolyzes emoyeni oswakeme ukuze ikhiphe igesi enobuthi ye-hydrogen chloride. Ngakho-ke, izinyathelo zokuphepha ezifanele kufanele zithathwe lapho kusingathwaI-Boron trichloride, okuhlanganisa ukugqoka izingubo zokuzivikela, izibuko nempahla yokuvikela ukuphefumula, nokusebenza endaweni enomoya omuhle.