I-Boron trichloride (BCl3)iyinhlanganisela engeyona into ephilayo evame ukusetshenziswa ezinqubweni zokufaka umhwamuko owomile kanye ne-chemical vapor deposition (CVD) ekukhiqizweni kwe-semiconductor. Iyigesi engenambala enephunga elinamandla elinomunyu ekamelweni lokushisa futhi iyazwela emoyeni omanzi ngoba iyancibilika ukuze ikhiqize i-hydrochloric acid kanye ne-boric acid.

Ukusetshenziswa kwe-Boron Trichloride

Embonini ye-semiconductor,I-Boron trichlorideIsetshenziswa kakhulu ekuqopheni i-aluminium okomile kanye nanjenge-dopant ukwakha izifunda zohlobo lwe-P kuma-wafer e-silicon. Ingasetshenziswa futhi ukuqopha izinto ezifana ne-GaAs, i-Si, i-AlN, kanye nomthombo we-boron kwezinye izinhlelo zokusebenza ezithile. Ngaphezu kwalokho, i-Boron trichloride isetshenziswa kabanzi ekucubungulweni kwensimbi, embonini yengilazi, ekuhlaziyweni kwamakhemikhali kanye nasekucwaningweni kwelabhorethri.

Ukuphepha kwe-Boron Trichloride

I-Boron trichlorideiyagqwala futhi inobuthi futhi ingabangela umonakalo omkhulu emehlweni nasesikhumbeni. Iyamanzi emoyeni omanzi ukuze ikhiphe igesi enobuthi ye-hydrogen chloride. Ngakho-ke, kudingeka kuthathwe izinyathelo zokuphepha ezifanele lapho kuphathwaI-Boron trichloride, okuhlanganisa ukugqoka izingubo zokuzivikela, izibuko kanye nemishini yokuvikela ukuphefumula, kanye nokusebenza endaweni enomoya omuhle.